Paper Title
Fabrication of Low Cost Atomic Layer Deposition System for the Preparation of Ultrathin ZnO Films for Optoelectronic Applications
Abstract
. A low cost atomic layer deposition system was designed and fabricated for the deposition of Ultra thin Zinc oxide
films. Diethyl
iethyl Zinc and Deionized water were used as Zinc and Oxygen precursors respectively and high pur
purity Argon gas as
purging gas. Ultra thin layer of ZnO was prepared on glass substrates.
substrate . The deposited thin film
films were investigated for
structural, optical and morphological studies using Glancing angle X-ray diffraction (GAXRD), Spectroscopic
pectroscopic ellipsometer,
UV–VIS
VIS spectrometer, Scanning electron microscope etc
Index terms: Atomic layer deposition, System Fabrication, Ultrathin ZnO film, GAXRD